Diffusion and solubility of Au implanted into the AZ1350 photoresist

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 166, Issue , 2000, Pages 615-620

  Soares, M R F ^a   Kaschny, J R A ^a   Dos Santos, J H R ^a   Amaral, L ^a   Behar, M ^a   Fink, D ^b  

^a FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

^b HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ANNEALING; DIFFUSION IN SOLIDS; GOLD; ION IMPLANTATION; RADIATION DAMAGE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SOLUBILITY;

ATOMIC DIFFUSION;

PHOTORESISTS;

EID: 0033729183     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)01193-3     Document Type: Article

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