Reactive ion etching (RIE) as a method for texturing polycrystalline silicon solar cells

Solar Energy Materials and Solar Cells

Volumn 46, Issue 3, 1997, Pages 239-248

  Winderbaum, S ^a   Reinhold, O ^b   Yun, F ^c  

^a UNIVERSITY OF SOUTH AUSTRALIA   (Australia)

^b DEFENCE SCIENCE AND TECHNOLOGY ORGANISATION   (Australia)

^c UNIVERSITY OF NEW SOUTH WALES   (Australia)

Author keywords

Polycrystalline silicon; Polysilicon; Reactive Ion Etching; Reflectivity; Texturing

Indexed keywords

REFLECTIVITY MEASUREMENT; WET ANISOTROPIC ETCH TECHNIQUE;

CRYSTAL STRUCTURE; POLYCRYSTALLINE MATERIALS; REACTIVE ION ETCHING; TEXTURES;

SILICON SOLAR CELLS;

EID: 0031163170     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(97)00011-1     Document Type: Article

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