Nickel-chrome-iron alloy film deposited by pulsed arc deposition

IEEE Transactions on Plasma Science

Volumn 30, Issue 2 I, 2002, Pages 725-727

  Cai, Changlong ^a   Wang, Jimei ^a   Yan, Yixin ^b   Hang, Lingxia ^b   Zhu, Chang ^b  

^a XI'AN JIAOTONG UNIVERSITY   (China)

^b XI'AN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Deposition; Film uniformity; Ion plating; Nickel chrome iron alloy film

Indexed keywords

CATHODES; COMPOSITION; DEPOSITION; PLATING; SUBSTRATES;

PULSED ARC DEPOSITION;

NICKEL ALLOYS;

EID: 0036549667     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2002.1024275     Document Type: Article

References (7)

1. Cathodic arc plasma deposition as a coating technique and its development
2. An overview of some advanced surface technology in Russia
3. Distribution of ion current density in a modified pulse arc process as a function of pulse parameters
4. Radial uniformity of an external-coil ionized physical vapor deposition source