Dry etching of organic low dielectric constant film without etch stop layer

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 41, Issue 4 A, 2002, Pages

  Mizumura, Michinobu ^a   Fukuyama, Ryouji ^a   Oomoto, Yutaka ^a  

^a HITACHI LTD   (Japan)

Author keywords

Damascene; Dielectric constant material; Dry etch; Etch stop layer; Low k; Organic film; Subtrenching

Indexed keywords

DRY ETCHING; ELECTRON CYCLOTRON RESONANCE; PERMITTIVITY; PLASMA ETCHING;

SUBTRENCHING;

DIELECTRIC FILMS;

EID: 0036544487     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.l425     Document Type: Article

References (5)