X-ray photoelectron spectroscopy of amorphous AlN alloys prepared by reactive rf sputtering

Journal of Non-Crystalline Solids

Volumn 299-302, Issue PART 1, 2002, Pages 323-327

  Ribeiro, Cris T M ^a   Zanatta, A R ^a   Alvarez, F ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM ALLOYS; CHEMICAL BONDS; DEPOSITION; GROWTH KINETICS; SPUTTERING; SUBSTRATES; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

RADIOFREQUENCY SPUTTERING;

THIN FILMS;

EID: 0036540624     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(01)01190-5     Document Type: Conference Paper

References (12)