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Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 188, Issue 1-4, 2002, Pages 183-188

Irradiation damage technology for manufacturable Josephson junctions

(12) Kang, D J a,d Peng, N H b Webb, R b Jeynes, C b Burnell, G a Yun, J H c Moon, S H c Oh, B c Tarte, E J a Moore, D F a Kelly, M b Blamire, M G a

a UNIVERSITY OF CAMBRIDGE (United Kingdom)

b UNIVERSITY OF SURREY (United Kingdom)

c LG Electronics Inc (South Korea)

d UNIVERSITY OF CAMBRIDGE (United Kingdom)

Author keywords

Ion damage; Nanotechnology; Superconductor normal superconductor Josephson junctions

Indexed keywords

HIGH ENERGY PHYSICS; ION BEAMS; ION IMPLANTATION; JOSEPHSON JUNCTION DEVICES; NANOTECHNOLOGY; SUPERCONDUCTING FILMS; YTTRIUM BARIUM COPPER OXIDES;

ION DAMAGES;

ION BOMBARDMENT;

EID: 0036533818 PISSN: 0168583X EISSN: None Source Type: Journal
DOI: 10.1016/S0168-583X(01)01079-5 Document Type: Conference Paper

Times cited : (6)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.