Low temperature plasma chemical vapour deposition of carbon nanotubes

Diamond and Related Materials

Volumn 11, Issue 3-6, 2002, Pages 918-921

  Wilson, J I B ^a   Scheerbaum, N ^a   Karim, S ^a   Polwart, N ^a   John, P ^a   Fan, Y ^b   Fitzgerald, A G ^b  

^a HERIOT WATT UNIVERSITY   (United Kingdom)

^b UNIVERSITY OF DUNDEE   (United Kingdom)

Author keywords

Carbon; Chemical vapour deposition; Plasma; Spectroscopy

Indexed keywords

ALUMINA; ARGON; CATALYSTS; HYDROGEN; IRON COMPOUNDS; LOW TEMPERATURE EFFECTS; METHANE; MICROWAVES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

SUBSTRATE HEATING;

CARBON NANOTUBES;

PLASMA TREATMENT;

EID: 0036508081     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(01)00725-7     Document Type: Article

References (10)