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Journal of the Electrochemical Society

Volumn 149, Issue 3, 2002, Pages

In situ protection of silicon wafers against metal contamination in furnace processes without environmental hazard

(4) Bauer, M L a Steinle, J E a Wex, H a Georicke, H a

a Texas Instruments Deutschland GmbH (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHLORINE; CHROMIUM; CLEANING; CMOS INTEGRATED CIRCUITS; CONTAMINATION; COPPER; INTEGRATED CIRCUIT MANUFACTURE; IRON; OXIDATION; POTASSIUM; SODIUM;

CHLORINE-BASED CLEANING; METAL CONTAMINATION;

SILICON WAFERS;

EID: 0036503740 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1448505 Document Type: Article

Times cited : (2)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.