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Volumn 236, Issue 1-3, 2002, Pages 273-280
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Alloy composition dependence in selective area epitaxy on InP substrates
a
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Author keywords
A3. Metalorganic chemical vapor deposition; A3. Selective epitaxy; B2. Semiconducting III V materials; B3. Optical fiber devices
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Indexed keywords
ALLOYS;
DIFFUSION;
EPITAXIAL GROWTH;
FILM GROWTH;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
SEMICONDUCTING INDIUM PHOSPHIDE;
SUBSTRATES;
SELECTIVE EPITAXY;
VAPOR PHASE DIFFUSION;
SEMICONDUCTING FILMS;
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EID: 0036498792
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-0248(01)02215-1 Document Type: Article |
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Times cited : (17)
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References (15)
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