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Volumn 151-152, Issue , 2002, Pages 51-54
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Morphology and electrical properties of titanium oxide nanometric multilayers deposited by DC reactive sputtering
a
a
EPFL
(Switzerland)
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Author keywords
Multilayer; Nanometric; Reactive sputtering; Thin film; Titanium oxide
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
DEPOSITION;
DOPING (ADDITIVES);
ELECTRIC CONDUCTIVITY;
GRAIN BOUNDARIES;
MAGNETRON SPUTTERING;
MULTILAYERS;
NANOSTRUCTURED MATERIALS;
OPTICAL PROPERTIES;
SYNTHESIS (CHEMICAL);
TITANIUM OXIDES;
X RAY DIFFRACTION ANALYSIS;
NANOMETRIC MULTILAYERS;
REACTIVE SPUTTERING;
THIN FILMS;
ELECTRICAL PROPERTY;
MORPHOLOGY;
SPUTTERING;
TITANIUM OXIDE;
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EID: 0036495308
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/S0257-8972(01)01584-5 Document Type: Article |
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Times cited : (10)
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References (8)
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