High-density etching plasma excitation by slot type and coaxial line type of microwave antennas

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 20, Issue 2, 2002, Pages 513-520

  Yamauchi, Takeshi ^a   Sugai, H ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; ELECTRIC CONDUCTORS; INTERFACES (MATERIALS); MAGNETOELECTRIC EFFECTS; MICROWAVE ANTENNAS; MICROWAVES; POLYCRYSTALLINE MATERIALS; SILICA; SLOT ANTENNAS; SURFACE WAVES; TRANSMISSION ELECTRON MICROSCOPY;

COAXIAL LINE ANTENNAS; SURFACE WAVE PLASMAS (SWP);

PLASMA ETCHING;

EID: 0036494229     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1451276     Document Type: Article

References (8)