Effect of thickness and upper electrode diameter on polarization switching and electron emission of Pb(Zr 0.8Ti 0.2)O 3 ferroelectric cathode

Journal of Applied Physics

Volumn 91, Issue 3, 2002, Pages 1458-1463

  Park, Jihoon ^a   Kim, Yong Tae ^a   Yoon, Ki Hyun ^a  

^a Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ASYMMETRIC ELECTRODES; ELECTRIC FIELD DISTRIBUTIONS; ELECTRODE DIAMETERS; ENHANCED POLARIZATION; FERROELECTRIC CATHODES; FERROELECTRIC ELECTRON EMISSIONS; FERROELECTRIC SURFACES; FERROELECTRIC THICKNESS; FIELD DISTRIBUTION; POLARIZATION SWITCHING; STRAY FIELD; STRUCTURAL EFFECT; SWITCHING CHARGE; THRESHOLD FIELDS; TWO-DIMENSIONAL STRUCTURES;

CATHODES; ELECTRIC FIELDS; FERROELECTRICITY; LEAD; OPTICAL SWITCHES; ZIRCONIUM;

FERROELECTRIC MATERIALS;

EID: 0036469873     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1428104     Document Type: Article

References (35)

1. H. Gundel, H. Riege, J. Handerek, and K. Zioutas, Appl. Phys. Lett. 54, 2071 (1989). apl APPLAB 0003-6951
2. H. Gundel, H. Riege, E. Wilson, J. Handerek, and K. Zioutas, Bull. Am. Phys. Soc. 34, 193 (1989). bap BAPSA6 0003-0503
3. J. D. Ivers, L. Schächter, J. A. Nation, G. S. Kerslick, and R. Advani, J. Appl. Phys. 73, 2667 (1993). jap JAPIAU 0021-8979
4. B. Jiang, G. Kirkman, and N. Reinhardt, Appl. Phys. Lett. 66, 1196 (1995). apl APPLAB 0003-6951
5. H. Riege, I. Boscolo, J. Handerek, and U. Herleb, J. Appl. Phys. 84, 1602 (1998). jap JAPIAU 0021-8979
6. O. Auciello, M. A. Ray, D. Palmer, J. Duarte, G. E. McGurie, and D. Temple, Appl. Phys. Lett. 66, 2183 (1995). apl APPLAB 0003-6951
7. Y. T. Kim, K. H. Yoon, T. H. Kim, and K. B. Park, Appl. Phys. Lett. 75, 1964 (1999). apl APPLAB 0003-6951
8. R. Drori, M. Einat, D. Shur, E. Jerby, G. Rosenman, R. Advani, R. J. Temkin, and C. Pralong, Appl. Phys. Lett. 74, 335 (1999). apl APPLAB 0003-6951
9. S. E. Sampayan, G. J. Caporaso, C. L. Holmes, E. J. Lauer, D. Prosnitz, D. O. Trimble, and G. A. Westenskow, Nucl. Instrum. Methods Phys. Res. A 340, 90 (1994). nia NIMAER 0168-9002
10. T. C. Cavazos, W. L. Wilbanks, C. B. Fleddermann, and D. A. Shiffler, Appl. Phys. Lett. 65, 2612 (1994). apl APPLAB 0003-6951
11. Ya. E. Krasik, A. Dunaevsky, and J. Felsteiner, Appl. Phys. Lett. 73, 453 (1998). apl APPLAB 0003-6951
12. H. Gundel, H. Riege, E. J. N. Wilson, J. Handerek, and K. Zioutas, Appl. Phys. Lett. 54, 2071 (1989). apl APPLAB 0003-6951
13. J. Asano, S. Iwasaki, M. Okuyama, and Y. Hamakawa, Jpn. J. Appl. Phys., Part 1 32, 4284 (1993). jjb JAPNDE 0021-4922
14. M. Okuyama, J. Asano, and Y. Hamakawa, Jpn. J. Appl. Phys., Part 1 33, 5506 (1994). jjb JAPNDE 0021-4922
15. D. Shur, G. Rosenman, and Ya. Krasik, Appl. Phys. Lett. 70, 574 (1997). apl APPLAB 0003-6951
16. N. J. Shannon, P. W. Smith, P. J. Dobson, and M. J. Shaw, Appl. Phys. Lett. 70, 1625 (1997). apl APPLAB 0003-6951
17. G. Rosenman, D. Shur, Ya. E. Krasik, and A. Dunaevsky, J. Appl. Phys. 88, 6109 (2000). jap JAPIAU 0021-8979
18. H. C. Miller, IEEE Trans. Electr. Insul. 24, 765 (1989). itn IETIAX 0018-9367
19. G. Benedek, I. Boscolo, J. Handerek, and H. Riege, J. Appl. Phys. 81, 1396 (1997). jap JAPIAU 0021-8979
20. H. Gundel, in Science and Technology of Electroceramic Thin Films, edited by O. Auciello and R. Waser (Kluwer, Dordrecht, 1995), p. 335.
21. G. Rosenman, D. Shur, Kh. Garb, R. Cohen, and Ya. Krasik, J. Appl. Phys. 82, 772 (1997). jap JAPIAU 0021-8979
22. D. Averty, J. L. Chartier, H. Gundel, and R. Le. Bihan, Integr. Ferroelectr. 18, 91 (1997). itf IFEREU 1058-4587
23. M. Miyake, S. Ibuka, K. Yasuoka, and S. Ishii, Jpn. J. Appl. Phys., Part 1 36, 6004 (1997). jjb JAPNDE 0021-4922
24. H. Gundel, Integr. Ferroelectr. 5, 211 (1994). itf IFEREU 1058-4587
25. C. B. Fleddermann and J. A. Nation, IEEE Trans. Plasma Sci. 25, 212 (1997). tps ITPSBD 0093-3813
26. G. Benedek, I. Boscolo, A. Moscatelli, A. Scurati, and J. Handerek, J. Appl. Phys. 83, 2766 (1998). jap JAPIAU 0021-8979
27. H. Gundel and A. Meineke, Ferroelectrics 146, 29 (1993). fer FEROA8 0015-0193
28. D. Averty, H. Gundel, E. Seveno, and R. Le Bihan, Proceedings of the 11th IEEE International Symposium on Applications of Ferroelectrics, Montreux, Switzerland, August 24-27, 1998.
29. W. Zhang and W. Huebner, J. Appl. Phys. 83, 6034 (1998). jap JAPIAU 0021-8979
30. J. Asano, T. Imai, M. Okuyama, and Y. Hamakawa, Jpn. J. Appl. Phys., Part 1 31, 3098 (1992). jjb JAPNDE 0021-4922
31. W. Zhang, W. Huebner, S. E. Sampayanm, and M. L. Krogh, J. Appl. Phys. 83, 6055 (1998). jap JAPIAU 0021-8979
32. I. Boscolo, A. Scurati, and M. Stellato, J. Appl. Phys. 85, 8337 (1999). jap JAPIAU 0021-8979
33. D. Flechtner, C. Golkowski, J. D. Ivers, G. S. Kerslick, J. A. Nation, and L. Schachter, J. Appl. Phys. 83, 955 (1998). jap JAPIAU 0021-8979
34. A. Dunaevsky, Ya. E. Krasik, J. Felsteiner, and S. Dorfman, J. Appl. Phys. 85, 8474 (1999). jap JAPIAU 0021-8979
35. F. Liu and C. B. Fleddermann, Appl. Phys. Lett. 76, 1618 (2000). apl APPLAB 0003-6951