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Volumn 403-404, Issue , 2002, Pages 193-196
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Effect of small crystal size and surface temperature on the Raman spectra of amorphous and nanostructured Si thin films deposited by radiofrequency plasmas
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Author keywords
Crystallization; Nanostructured; Polymorphous silicon; Raman scattering; RF plasma
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Indexed keywords
AMORPHOUS SILICON;
CRYSTAL STRUCTURE;
FILM GROWTH;
LASER BEAM EFFECTS;
LASER PRODUCED PLASMAS;
NANOSTRUCTURED MATERIALS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
RAMAN SCATTERING;
RADIOFREQUENCY PLASMAS;
THIN FILMS;
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EID: 0036467747
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(01)01558-9 Document Type: Conference Paper |
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Times cited : (15)
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References (16)
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