Thermal stability study of the insulator layer in NiFe/CoFe/Al2O3/Co spin-dependent tunnel junction

Journal of Magnetism and Magnetic Materials

Volumn 239, Issue 1-3, 2002, Pages 116-119

  Liao, C C ^a   Ho, C H ^b   Huang, R T ^a   Chen, F R ^a   Kai, J J ^a   Chen, L C ^a   Lin, M T ^b   Yao, Y D ^c  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^c INSTITUTE OF PHYSICS   (Taiwan)

Author keywords

Interfacial roughness; Spin polarization; Thermal stability; Tunneling magnetoresistance

Indexed keywords

ANNEALING; DIFFUSION; ELECTRIC INSULATORS; ELECTRODES; INTERFACES (MATERIALS); MAGNETIC MOMENTS; MAGNETORESISTANCE; POLARIZATION; SURFACE ROUGHNESS; THERMODYNAMIC STABILITY;

TUNNELING MAGNETORESISTANCE (TMR);

TUNNEL JUNCTIONS;

EID: 0036466053     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(01)00578-9     Document Type: Article

References (9)