Magnetism and magnetoresistance of Co/Cu multilayer films produced by pulse control electrodeposition method

Journal of Magnetism and Magnetic Materials

Volumn 239, Issue 1-3, 2002, Pages 272-275

  Yamada, A ^a   Houga, T ^a   Ueda, Y ^a  

^a MURORAN INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Electrodeposition; Magnetic properties; Magnetoresistance; Multilayer films

Indexed keywords

COBALT; COPPER; ELECTRODEPOSITION; MAGNETISM; MAGNETORESISTANCE; MICROCOMPUTERS; MULTILAYERS;

MULTILAYER FILMS; PULSE CONTROL ELECTRODEPOSITION;

MAGNETIC FILMS;

EID: 0036465337     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(01)00569-8     Document Type: Article

References (6)