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Volumn 722, Issue , 2002, Pages 395-400

Frequency selective surfaces enable MEMS gas sensor

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; CARBON DIOXIDE; CHEMICAL SENSORS; ETCHING; METALLIC FILMS; POLLUTION;

EID: 0036458311     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-722-l3.4     Document Type: Conference Paper
Times cited : (5)

References (7)
  • 3
    • 0000168387 scopus 로고    scopus 로고
    • Enhancement and suppression of thermal emission by a three-dimensional photonic crystal
    • S.Y. Lin, J.G. Fleming, E. Chow, J. Bur, K.K. Choi, and A. Goldberg, "Enhancement and Suppression of Thermal Emission by a Three-Dimensional Photonic Crystal", Phys. Rev. B, 62 (4), pp. 2243-2246, 2000.
    • (2000) Phys. Rev. B , vol.62 , Issue.4 , pp. 2243-2246
    • Lin, S.Y.1    Fleming, J.G.2    Chow, E.3    Bur, J.4    Choi, K.K.5    Goldberg, A.6
  • 4
    • 0000307906 scopus 로고    scopus 로고
    • Modeling parameters for the spectral behavior of infrared frequency-selective surfaces
    • I. Puscasu, W.L., Schaich, and G.D. Boreman, "Modeling Parameters for the Spectral Behavior of Infrared Frequency-Selective Surfaces," App. Opt., 40 (1), pp. 118-124, 2001.
    • (2001) App. Opt. , vol.40 , Issue.1 , pp. 118-124
    • Puscasu, I.1    Schaich, W.L.2    Boreman, G.D.3
  • 5
    • 0012055754 scopus 로고    scopus 로고
    • Patent No. 5838016
    • E.A. Johnson, Patent No. 5838016.
    • Johnson, E.A.1
  • 7
    • 0030393149 scopus 로고    scopus 로고
    • The role of thermal radiative properties of semiconductor wafers in rapid thermal processing
    • P.J. Timans, "The role of thermal radiative properties of semiconductor wafers in rapid thermal processing", Mat. Res. Soc. Symp. Proc. 429, 3, 1996.
    • (1996) Mat. Res. Soc. Symp. Proc. , vol.429 , pp. 3
    • Timans, P.J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.