Invited paper - Future for low-temperature polycrystalline silicon

SID Conference Record of the International Display Research Conference

Volumn , Issue , 2002, Pages 269-272

  Nishibe, Tohru ^a  

^a Research and Development Center   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLIZATION; ELECTRIC INSULATORS; GLASS; INTEGRATED CIRCUITS; LOW TEMPERATURE EFFECTS; POLYCRYSTALLINE MATERIALS; SUBSTRATES; THIN FILM TRANSISTORS;

SYSTEM-ON-GLASS (SOG);

POLYSILICON;

EID: 0036457795     PISSN: 10831312     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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