High-performance DUV inspection system for 100nm-generation masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4754, Issue , 2002, Pages 526-533

  Tsuchiya, Hideo ^a   Isomura, Ikunao ^a   Nakashima, Kazuhiro ^a   Yamashita, Kyoji ^a   Watanabe, Toshiyuki ^a   Nishizaka, Takeshi ^a   Ikeda, Hiroyuki ^a   Sawa, Eiji ^a   Ikeda, Masami ^b  

^a TOSHIBA CORPORATION   (Japan)

^b Toshiba Machine Co Ltd   (Japan)

Author keywords

CD error; Defect; Die to database; Inspection; Phase shift mask

Indexed keywords

DATA PROCESSING; DATABASE SYSTEMS; ERROR ANALYSIS; LSI CIRCUITS; OPTICAL RESOLVING POWER; PHASE SHIFT;

CRITICAL DIMENSION (CD) ERRORS;

MASKS;

EID: 0036454508     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.476961     Document Type: Conference Paper

References (2)

1. M. Tabata, et al., "High resolution DUV inspection system for 150nm generation masks," SPIE Vol.3873, pp138-146, 1999.
2. H. Tsuchiya, et al., "A gray map reference pattern generator of a die-to-database mask inspection system for 256Mbit and 1Gbit DRAMs," SPIE Proceedings, Vol.3412, pp544-551, 1998.