Influence of oxygen addition and substrate temperature on textured growth of Al-doped ZnO thin films prepared by RF magnetron sputtering

Materials Research Society Symposium - Proceedings

Volumn 721, Issue , 2002, Pages 171-176

  Kuppusami, P ^b   Diesner, K ^a   Sieber, I ^a   Ellmer, K ^a  

^a HAHN MEITNER INSTITUT   (Germany)

^b INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CRYSTAL GROWTH; MAGNETRON SPUTTERING; OXYGEN; SEMICONDUCTOR DOPING; TEXTURES; ZINC OXIDE;

TEXTURED GROWTH;

THIN FILMS;

EID: 0036454379     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-721-j6.5     Document Type: Conference Paper

References (5)

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2. T. Minami, MRS Bull. 25, 38 (2000).
3. R.G. Gordon, MRS Bull. 25, 52 (2000).
4. K. Ellmer, J. Phys. D: Appl. Phys. 33, R17 (2000).
5. T. Tsuji and M. Hirohashi, Appl. Surf. Sci. 157, 47 (2000).