Dynamics of high-repetition-rate laser plasma extreme ultraviolet sources from droplet targets

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4760, Issue I, 2002, Pages 454-462

  Keyser, Christian ^a   Richardson, Martin ^a   Turcu, Edmund ^b  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

^b JMAR Technologies Inc   (United States)

Author keywords

EUV lithography; Interferometry; Laser plasma; Pulse slicer; Water droplet target

Indexed keywords

ATOMIC PHYSICS; CARRIER CONCENTRATION; COMPUTER SIMULATION; HYDRODYNAMICS; INTERFEROMETRY; LITHOGRAPHY; X RAYS;

PLASMA INTERFEROGRAMS;

LASER PRODUCED PLASMAS;

EID: 0036442831     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482117     Document Type: Conference Paper

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