620 MHz AT-cut fundamental crystal resonator

Proceedings of the Annual IEEE International Frequency Control Symposium

Volumn , Issue , 2002, Pages 174-178

  Yamada, H ^a   Ura, H ^a   Fujiyama, H ^b  

^a Kyushu Dentsu Co Ltd   (Japan)

^b NAGASAKI UNIVERSITY   (Japan)

Author keywords

AT cut; Inverted mesa blank; Magnetron plasma

Indexed keywords

CRYSTAL OSCILLATORS; DRY ETCHING; ELECTRIC FREQUENCY CONTROL; MAGNETRON SPUTTERING; PLASMA ETCHING;

MAGNETRON PLASMA;

CRYSTAL RESONATORS;

EID: 0036441942     PISSN: 01616404     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)

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2. K. Kuwahara, Y. Matsuda and H. Fujiyama, Materials Science and Engineering, vol. A140, pp.691-695, 1991.
3. K. Kuwahara and H. Fujiyama, IEEE Transactions on Plasma Sci., vol.22, No.4, pp.442-443, 1994.
4. H. Yamada, H. Ura, K. Kuwahara and H. Fujiyama, T. IEE Japan, Vol. 119-A, No.4, pp.490-495, 1999.
5. H. Yamada, K. Kuwahara and H. Fujiyama, Thin Solid Films, vol.316, pp.6-12, 1998.
6. H. Yamada, H. Ura, K. Kuwahara and H. Fujiyama, ICRP-4/SPP-16, pp.239-240, 1998.