SiO2 etching characteristics in DC magnetron plasmas by using an external magnetic field

Thin Solid Films

Volumn 316, Issue 1-2, 1998, Pages 6-12

  Yamada, H ^a   Kuwahara, K ^a   Fujiyama, H ^a  

^a NAGASAKI UNIVERSITY   (Japan)

Author keywords

Magnetron plasma; Quartz resonator; SiO2 etching

Indexed keywords

ARGON; CRYSTAL RESONATORS; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; MAGNETRONS; OXYGEN; QUARTZ; SILICA;

MAGNETRON PLASMA ETCHING;

PLASMA ETCHING;

EID: 0032027591     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00379-4     Document Type: Article

References (4)

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2. K. Kuwahara, H. Fujiyama, IEEE 22 (1994) 442-447.
3. Y. Nagata, Chemical Materials of Cold Plasma, 1994, pp. 247-248 [in Japanese].
4. R. d'Agostino, F. Cramarossa, S.D. Benedictis, G. Ferraro, J. Appl. Phys. 52 (1981) 1262.