Theoretical analysis of the potential for maskless lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 I, Issue , 2002, Pages 98-106

  Mack, Chris A ^a  

^a KLA Tencor Austin   (United States)

Author keywords

Graybeam Address Grid; Image Quality; Maskless Lithography; Raster Scan Imaging

Indexed keywords

COMPUTER SIMULATION; IMAGE PROCESSING; IMAGE QUALITY; IMAGING SYSTEMS; MASKS;

MASKLESS LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0036411475     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474474     Document Type: Conference Paper

References (5)

1. C.A. Mack, "Impact of Graybeam Method of Virtual Address Reduction on Image Quality," 21st Annual BACUS Symposium on Photomask Technology, Proc., SPIE Vol. 4562 (2001) pp. 537-544.
2. M.L. Rieger, J.A. Schoeffel, P.A. Warkentin, "Image Quality Enhancements for Raster Scan Lithography," Optical/Laser Microlithography, SPIE Vol. 922 (1988) pp. 55-64.
3. C.A. Mack, "Electron Beam Lithography Simulation for Mask Making, Part VI: Comparison of 10 and 50 kV GHOST Proximity Effect Correction," Photomask and X-Ray Mask Technology VIII, Proc., SPIE Vol. 4409 (2001) pp. 194-203.
4. C.A. Mack, "Using the Normalized Image Log-Slope," Microlithography World (February, 2001) pp. 23-24.
5. C.A. Mack, "Using the Normalized Image Log-Slope, part 2," Microlithography Worm (May, 2001) pp. 20-22.