Comparison of OPC rules and common process windows for 130 nm features using binary and attenuated phase shift masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Reilly, Michael ^a   Parker, Colin ^a   Kvam, Karen ^a   Socha, Robert ^a   Dusa, Mircea ^a  

^a SHIPLEY COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; COMPUTER SOFTWARE; ELECTROMAGNETIC WAVE ATTENUATION; FOCUSING; IMAGE ANALYSIS; LIGHT TRANSMISSION; MASKS;

ATTENUATED PHASE SHIFT MASKS (APSM); BINARY MASKS; OPTICAL PROXIMITY CORRECTION (OPC);

PHOTOLITHOGRAPHY;

EID: 0033683077     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)