메뉴 건너뛰기




Volumn 15, Issue 4, 2002, Pages 643-654

A new photoresist material for 157 nm lithography-2

Author keywords

157 nm lithography; Chemically amplified photoresist; Photoacid generator; Poly(alkyl vinyl sulfonate)s

Indexed keywords

4 (1,1,1,3,3,3 HEXAFLUORO 2 HYDROXYPROPYL)STYRENE; NITRILE; POLY(2,2,2 TRIFLUOROETHYLVINYL SULFONATE); POLY(METHYLVINYL SULFONATE); POLYMER; STYRENE DERIVATIVE; SULFONIC ACID DERIVATIVE; UNCLASSIFIED DRUG;

EID: 0036361950     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.15.643     Document Type: Article
Times cited : (18)

References (37)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.