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Volumn 11, Issue 5, 2002, Pages 492-495

Structural properties of polycrystalline silicon films formed by pulsed rapid thermal processing

Author keywords

Microstructure; Polycrystalline silicon film; Rapid thermal processing

Indexed keywords


EID: 0036338568     PISSN: 10091963     EISSN: None     Source Type: Journal    
DOI: 10.1088/1009-1963/11/5/315     Document Type: Article
Times cited : (6)

References (25)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.