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Volumn 11, Issue 5, 2002, Pages 492-495
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Structural properties of polycrystalline silicon films formed by pulsed rapid thermal processing
a a a a a a a a |
Author keywords
Microstructure; Polycrystalline silicon film; Rapid thermal processing
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Indexed keywords
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EID: 0036338568
PISSN: 10091963
EISSN: None
Source Type: Journal
DOI: 10.1088/1009-1963/11/5/315 Document Type: Article |
Times cited : (6)
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References (25)
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