Double threshold behaviour of I-V characteristics of CoSi2/Si Schottky contacts

Chinese Physics (Overseas Edition)

Volumn 11, Issue 2, 2002, Pages 156-162

  Zhu, Shi Yang ^a   Ru, Guo Ping ^a   Qu, Xin Ping ^a   Li, Bing Zong ^a   Van Meirhaeghe, R L ^a   Detavernier, C ^a   Cardon, F ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

Inhomogeneity; Metal semiconductor contact; Schottky barrier height

Indexed keywords

EID: 0036331055     PISSN: 10091963     EISSN: None     Source Type: Journal    
DOI: 10.1088/1009-1963/11/2/310     Document Type: Article

References (16)