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Volumn 3, Issue 3-4, 2002, Pages 727-730

Analysis of Residual Stress Gradient in MEMS Multi-layer Structure

Author keywords

Electron density; Gradient; MEMS; Multi layer; Residual stress; TFD; Thin films

Indexed keywords


EID: 0036325103     PISSN: 15651339     EISSN: None     Source Type: Journal    
DOI: 10.1515/IJNSNS.2002.3.3-4.727     Document Type: Article
Times cited : (4)

References (5)
  • 1
    • 0000073841 scopus 로고    scopus 로고
    • The tension of metallic films deposited by electrolysis
    • Stoney, G.G. The tension of metallic films deposited by electrolysis, Proc. Roy. Soc. London, 9(1909)172-175.
    • Proc. Roy. Soc. London , vol.9 , Issue.1909 , pp. 172-175
    • Stoney, G.G.1
  • 4
    • 20944432847 scopus 로고    scopus 로고
    • Analysis and computation of the internal stress in thin films
    • Cheng, K.J., and Cheng, S.Y. Analysis and computation of the internal stress in thin films, Progress in Natural Science, 8(6)(1998)679-689.
    • (1998) Progress in Natural Science , vol.8 , Issue.6 , pp. 679-689
    • Cheng, K.J.1    Cheng, S.Y.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.