Analysis and computation of the internal stress in thin films

Progress in Natural Science

Volumn 8, Issue 6, 1998, Pages 688-689

  Cheng, Kaijia ^a   Cheng, Shuyu ^a  

^a NORTHWEST INSTITUTE OF NUCLEAR TECHNOLOGY   (China)

Author keywords

Electron density; Interface; Internal stress

Indexed keywords

COMPOSITE FILMS; ELECTRON DENSITY MEASUREMENT; INTERFACES (MATERIALS); STRESS ANALYSIS; THIN FILMS;

FERMI-DIRAC MODEL; INTERNAL STRESS; THIN-FILMS; THOMAS-FERMI;

CARRIER CONCENTRATION;

EID: 20944432847     PISSN: 10020071     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (4)

1. Cheng, K. J., Application of TFD model and Yu's theory to material design, Progress in Natural Science, 1993, 3(3): 211.
2. Cheng, K. J., CHeng, S. Y., Theoretical foundation of condensed materials, Progress in Natural Science, 1996, 6(1): 12.
3. Cheng, K. J., Cheng, S. Y., Computation of heat of formation and EOS of alloys by the refined model, Acta Physica Sinica, 1993, 2(6): 439.
4. Cheng, S. Y., Cheng, K. J., A new method to the calculation of equation of state at null temperature, Proc. of 1990' CMRS International Symposium, 1990: 783.