Fabrication of Thin Film Vanadium Oxide for Microbolometer

International Journal of Nonlinear Sciences and Numerical Simulation

Volumn 3, Issue 3-4, 2002, Pages 299-302

  Chung, Chen Kuei ^a   Wu, Luh Huew ^a   Lee, Tzong Sheng ^a  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Microbolometer; Reactive sputter; TCR; Vanadium Oxide

Indexed keywords

EID: 0036319692     PISSN: 15651339     EISSN: None     Source Type: Journal    
DOI: 10.1515/IJNSNS.2002.3.3-4.299     Document Type: Article

References (12)

1. P. Umadevi, and G. Yadgiri , "A new thermistor material for thermistor bolometer: material preparation and characterization", Proc. SPIE 1485 (1991)195-205.
2. C.H. Griffiths and H.C. Eastwood. "Influence of stoichiometry on the metal-semiconductor transition in vanadium oxide", J. Appl. Phys. 45(5) (1974)2201-2206.
3. 3 ) thin films", J. Vac. Sci Technol. A9(3) (1991)461-465.
4. 2 thin films", J. Appl. Phys. 66(12) (1989)5844-5950.
5. 2 films", J. Vac. Sci Technol. A2(4) (1984)1509-1512.
6. J.B. MacChesney and H.J. Guggenheim, "Growth and electrical properties of vanadium dioxide single crystals containing selected impurity ions", J. Phys. Chem. Solids 30 (1969)225-234.
7. 2 thin films", J. Appl. Phys. 69(5) (1991)3231-3234.
8. H. Miyazaki, F. Utsuno, Y. Shigesato and I. Yasui, "The structure characterization of VOx films prepared by He-introduced reactive RF unbalanced magnetron sputtering", Thin Solid Films 281-282 (1996)436-440.
9. H. Jerominek, F. Picard and D. Vicent, "Vanadium oxide films for optical switching and detection", Optical Eng. 32 (1993)2092-2099.
10. E.E. Chain, "The influence of deposition temperature on the substrate and optical properties of vanadium oxide films", J. Vac. Sci. Technol. A4(3) (1986)432-435.
11. W.D. Westwood, in S.M. Rossnagel and J.J. Cuuomo, Handbook of Plasa Processing Technology, Noyes Publications, 1990, Chapter 9.
12. K.C. Liddard, "Thin film resistance bolometer IR detector-II", Infrared Phys.26(1) (1986)43-49.