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Journal of the Electrochemical Society
Volumn 149, Issue 1, 2002, Pages
The effects of nitrogen and plasma power on electrochemical properties of boron-doped diamond electrodes grown by MPCVD
(5)
Yagi, Ichizo
a
Tsunozaki, Kentaro
b
Fujishima, Akira
b
Ohtani, Bunsho
a
Uosaki, Kohei
a
a
HOKKAIDO UNIVERSITY
(
Japan
)
b
UNIVERSITY OF TOKYO
(
Japan
)
Author keywords
[No Author keywords available]
Indexed keywords
ATTENUATION; DEFECTS; DOPING (ADDITIVES); ELECTROCHEMISTRY; ELECTRODES; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
PLASMA POWER;
DIAMOND FILMS;
EID
:
0036230839
PISSN
:
00134651
EISSN
:
None
Source Type
:
Journal
DOI
:
10.1149/1.1425795
Document Type
:
Article
Times cited : (
5
)
References (
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.
