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Electrochemical and Solid-State Letters

Volumn 5, Issue 1, 2002, Pages

The use of spark ablation to produce calcium phosphate films on silicon

(3) Weis, Robert P a Chen, Yandong a Coffer, Jeffery L a

a TEXAS CHRISTIAN UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CALCIUM COMPOUNDS; CRYSTALLINE MATERIALS; FILM PREPARATION; INFRARED SPECTROSCOPY; LASER ABLATION; MORPHOLOGY; NANOSTRUCTURED MATERIALS; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SUBSTRATES; X RAY ANALYSIS;

CALCIUM PHOSPHATE; CRYSTALLINE SILICON SUBSTRATES; ENERGY DISPERSIVE X RAY ANALYSIS; INFRARED VIBRATIONAL SPECTROSCOPY; NANOPOROUS SURFACE MORPHOLOGY; SPARK ABLATION; SPARK PROCESSING;

SEMICONDUCTING FILMS;

EID: 0036225263 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.1420927 Document Type: Article

Times cited : (4)

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