Formation of rare-earth oxide doped silicon by spark processing

Applied Physics Letters

Volumn 68, Issue 24, 1996, Pages 3416-3418

  St John, John V ^a   Coffer, Jeffery L ^a   Gyu Rho, Young ^b   Pinizzotto, Russell F ^b  

^a TEXAS CHRISTIAN UNIVERSITY   (United States)

^b Center for Advanced Research and Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347398876     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.115778     Document Type: Article

References (13)

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