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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 20, Issue 1, 2002, Pages 93-101

Electron stimulated carbon adsorption in ultrahigh vacuum monitored by Auger electron spectroscopy

(2) Scheuerlein, C a Taborelli, M a

a CERN (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; AUGER ELECTRON SPECTROSCOPY; CARBON DIOXIDE; CARBON MONOXIDE; COPPER; ELECTRON IRRADIATION; METHANE; PARTICLE ACCELERATORS; SUBSTRATES; SURFACE TREATMENT; TITANIUM COMPOUNDS; ULTRAHIGH VACUUM;

AUGER PEAK INTENSITY; ELECTRON STIMULATED CARBON ADSORPTION; GAS PHASE ADSORPTION; GAS PHASE MOLECULE; NONEVAPORABLE GETTER THIN FILM COATING; OXYGEN-FREE ELECTROLYTIC COPPER; RADIATION INDUCED SURFACE MODIFICATION;

CARBON;

EID: 0036160416 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1424273 Document Type: Article

Times cited : (27)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.