Two-dimensional Si photonic crystals on oxide using SOI substrate

Optical and Quantum Electronics

Volumn 34, Issue 1-3, 2002, Pages 113-121

  Shinya, A ^a   Notomi, M ^a   Yokohama, I ^a   Takahashi, C ^b   Takahashi, J I ^b   Tamamura, T ^a,b  

^a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

^b NTT CORPORATION   (Japan)

Author keywords

Asymmetrical structure; FDTD method; Photonic band gap; Photonic integrated circuit; Transmission characteristics; Two dimensional photonic crystal

Indexed keywords

ENERGY GAP; FINITE DIFFERENCE METHOD; OXIDES; PHOTONS; SEMICONDUCTING SILICON; SILICON ON INSULATOR TECHNOLOGY; SUBSTRATES; TIME DOMAIN ANALYSIS;

PHOTONIC CRYSTALS;

INTEGRATED OPTOELECTRONICS;

EID: 0036154552     PISSN: 03068919     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1013396524703     Document Type: Article

References (8)