Micromachined Faraday cup array using deep reactive ion etching

Sensors and Actuators, A: Physical

Volumn 95, Issue 2-3, 2002, Pages 84-93

  Darling, Robert B ^a   Scheidemann, Adi A ^b   Bhat, K N ^c   Chen, T C ^a  

^a University of Washington   (United States)

^b Intelligent Ion Inc   (United States)

^c INDIAN INSTITUTE OF TECHNOLOGY MADRAS   (India)

Author keywords

Electronic multiplexing; Faraday cups; Ion sensors; Mass spectrometers

Indexed keywords

ELECTROSTATICS; ION BEAMS; IONS; MASS SPECTROMETERS; MICROMACHINING; MOS CAPACITORS; REACTIVE ION ETCHING; SILICON; STRUCTURE (COMPOSITION); SURFACE STRUCTURE;

CHEMICAL ANALYZER; DEEP REACTIVE ION ETCHING; ELECTRONIC MULTIPLEXING; ION COLLECTION STRUCTURE; ION SENSOR; MICROMACHINED FARADAY CUP ARRAY; MULTI-CHANNEL ION DETECTION; SILICON WEB;

PARTICLE DETECTORS;

EID: 0036143085     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(01)00718-X     Document Type: Article

References (10)

1. A technique for measuring, displaying, recording, and modifying the spatial uniformity of implanted ions
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5. Mass Spectrometry
6. Linear dispersion mass spectrometer
7. Micromachined faraday cup array using deep reactive ion etching
8. Properties of trench capacitors for high density DRAM applications
9. Development of a miniature gas chromatograph - Mass spectrometer with a microbore capillary column and array detector