Micromachined Faraday cup array using deep reactive ion etching

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2001, Pages 90-93

  Darling, Robert B ^a   Scheidemann, Adi A ^b   Bhat, K N ^c   Chen, T C ^a  

^a University of Washington   (United States)

^b Intelligent Ion Inc   (United States)

^c INDIAN INSTITUTE OF TECHNOLOGY MADRAS   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; MASS SPECTROMETERS; MICROMACHINING; REACTIVE ION ETCHING; THROUGHPUT;

MICROMACHINED FARADAY CUP ARRAYS (MFCA);

MOS CAPACITORS;

EID: 0035012061     PISSN: 10846999     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(01)00718-X     Document Type: Article

References (0)