Electron microscopic investigation of MnSi1.7 layers on Si(001)

Microelectronic Engineering

Volumn 60, Issue 1-2, 2002, Pages 247-254

  Mogilatenko, A ^a   Falke, M ^a   Teichert, S ^a   Schwendler, S ^a   Sarkar, D K ^a   Hinneberg, H J ^a  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Epitaxy; Higher manganese silicide; Silicide; Thin films growth

Indexed keywords

ELECTRON DIFFRACTION; ELECTRON MICROSCOPY; EPITAXIAL GROWTH; SEMICONDUCTING MANGANESE COMPOUNDS; THICKNESS MEASUREMENT; THIN FILMS;

HIGHER MANGANESE SILICIDES (HMS);

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0036132754     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00601-3     Document Type: Conference Paper

References (14)