Preparation of manganese suicide thin films by solid phase reaction

Applied Surface Science

Volumn 113-114, Issue , 1997, Pages 53-56

  Wang, Jinliang ^a   Hirai, Masaaki ^a   Kusaka, Masahiko ^a   Iwami, Motohiro ^a  

^a OKAYAMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS; COMPOSITION; ELECTRONIC PROPERTIES; EMISSION SPECTROSCOPY; SEMICONDUCTING MANGANESE COMPOUNDS; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH; SUBSTRATES;

MANGANESE SILICIDE; SOFT X RAY EMISSION SPECTROSCOPY; SOLID PHASE REACTION;

THIN FILMS;

EID: 4244211739     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00823-9     Document Type: Article

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