Deep etching of silicon with XeF2 gas

Canadian Conference on Electrical and Computer Engineering

Volumn 1, Issue , 2002, Pages 460-464

  Bahreyni, Behraad ^a   Shafai, C ^a  

^a UNIVERSITY OF MANITOBA   (Canada)

Author keywords

Etching profile; Micromachining; XeF2

Indexed keywords

GAS PHASE ETCHINGS;

COMPUTER SIMULATION; COMPUTER SOFTWARE; ETCHING; LOADING; MICROMACHINING; PARAMETER ESTIMATION; SUBSTRATES; TRENCHING; XENON;

SEMICONDUCTING SILICON;

EID: 0036067809     PISSN: 08407789     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/CCECE.2002.1015269     Document Type: Conference Paper

References (5)

1. Controlled pulsed-etching with xenon difluoride
2. Gas-phase silicon etching with bromine trifluoride
3. Simulation study of micro-loading phenomena in silicon dioxide hole etching
4. 2 with silicon
5. 2