Evolution of the scaling of the surface roughness observed on sputtered copper films with atomic force microscope

Shinku/Journal of the Vacuum Society of Japan

Volumn 45, Issue 3, 2002, Pages 134-137

  Ohkawa, Kenji ^a   Nakano, Takeo ^a   Baba, Shigeru ^a  

^a SEIKEI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; COPPER; CORRELATION METHODS; DEPOSITION; METALLIC FILMS; PRESSURE; SPUTTERING;

ARGON GAS PRESSURE; COPPER FILMS; SCALING ANALYSIS;

SURFACE ROUGHNESS;

EID: 0036065911     PISSN: 05598516     EISSN: None     Source Type: Journal    
DOI: 10.3131/jvsj.45.134     Document Type: Article

References (8)