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Volumn 692, Issue , 2002, Pages 691-695

Fabrication of microstructures for microphotonic circuit

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; ELECTRON BEAM LITHOGRAPHY; ENERGY GAP; LIGHT PROPAGATION; OPTICAL WAVEGUIDES; REACTIVE ION ETCHING; SILICON ON INSULATOR TECHNOLOGY;

EID: 0036056172     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (3)

References (11)
  • 9
    • 0000234304 scopus 로고
    • Sub-50 nm high aspect ratio silicon pillars, ridges, and wenches fabricated using ultrahigh resolution electron beam lithography and reactive ion etching
    • (1993) Appl. Phys. Lett. , vol.62 , pp. 1414
    • Fischer, P.B.1    Chou, S.Y.2
  • 10
    • 0005584815 scopus 로고
    • PhD thesis, Cambridge, Chapter 4
    • (1993)
    • Paul, D.J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.