Reliability projection and polarity dependence of TDDB for ultra thin CVD HfO2 gate dielectrics

IEEE Symposium on VLSI Circuits, Digest of Technical Papers

Volumn , Issue , 2002, Pages 78-79

  Lee, Sung Joo ^a   Rhee, S J ^a   Clark, R ^a   Kwong, D L ^a  

^a The University of Texas at Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIELECTRIC MATERIALS; ELECTRODES; HAFNIUM COMPOUNDS; LEAKAGE CURRENTS; MOS CAPACITORS; TANTALUM COMPOUNDS;

GATE DIELECTRICS;

GATES (TRANSISTOR);

EID: 0036054242     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)