High performance CMOS operation of strained-SOI MOSFETs using thin film SiGe-on-insulator substrate

IEEE Symposium on VLSI Circuits, Digest of Technical Papers

Volumn , Issue , 2002, Pages 106-107

  Mizuno, T ^a   Sugiyama, N ^a   Tezuka, T ^a   Numata, T ^a   Takagi, S ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; ELECTRON MOBILITY; HOLE MOBILITY; SEMICONDUCTOR DOPING; SILICON ON INSULATOR TECHNOLOGY; STRAIN; SUBSTRATES; THIN FILMS;

MOBILITY ENHANCEMENT;

MOSFET DEVICES;

EID: 0036049563     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)