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Volumn , Issue , 2002, Pages 335-338

Molecular beam epitaxial growth and rapid thermal annealing effect of digital-alloy (In0.53Ga0.47As)1-z(In0.52Al0.4 8As)z lattice-matched to InP for 1.3 - 1.55 μm multi-quantum wells

Author keywords

[No Author keywords available]

Indexed keywords

EXCITONS; MOLECULAR BEAM EPITAXY; MONOLAYERS; PHONONS; RAPID THERMAL ANNEALING; SEMICONDUCTING INDIUM GALLIUM ARSENIDE; SEMICONDUCTOR QUANTUM WELLS; SUPERLATTICES; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0036048516     PISSN: 10928669     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (6)

References (12)
  • 11
    • 0031269481 scopus 로고    scopus 로고
    • Molecular beam epitaxy technology of III-V compound semiconductors for optoelectronic applications
    • (1997) Proc. IEEE , vol.85 , pp. 1694
    • Cheng, K.Y.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.