Measuring thermophysical properties of ultrathin photoresist films

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4690 II, Issue , 2002, Pages 936-942

  D'Amour, J Nelson ^a   Frank, Curtis W ^a   Okoroanyanwu, Uzodinma ^b  

^a Stanford University   (United States)

^b ADVANCED MICRO DEVICES   (United States)

Author keywords

Glass transition temperature; Photoacid generator; Photoresist; Polystyrene; Ultrathin film

Indexed keywords

ELLIPSOMETRY; GLASS TRANSITION; POLYSTYRENES; SILICON; THERMODYNAMIC PROPERTIES; ULTRATHIN FILMS;

PHOTOACID GENERATORS;

PHOTORESISTS;

EID: 0036031577     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474167     Document Type: Article

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