Overlay registration target design for wafer-induced shift characterization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4689 II, Issue , 2002, Pages 706-714

  Ihochi, Albert L ^a   Wong, Alan S ^a  

^a INTEL CORPORATION   (United States)

Author keywords

CMP; Metal offset; Overlay; Registration; Wafer induced shift

Indexed keywords

CHEMICAL MECHANICAL POLISHING; DEPOSITION; ETCHING; PHOTORESISTS;

WAFER-INDUCED SHIFTS;

SILICON WAFERS;

EID: 0036031521     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.473513     Document Type: Conference Paper

References (1)

1. P.C. Hinnen, H.J.L. Megens, M. van der Schaar, R.J.F. van Haren, E.C. Mos, S. Lalbahadoersing, F. Bornebroek, D. Laidler, "Advances in Process Overlay," Proc. SPIE, vol. 4344 (2001), pp. 114-126.