Matching and monitoring a CD-SEM tool cluster

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4689 II, Issue , 2002, Pages 1171-1178

  Sicignano, A ^a   Nikitin, A V ^a   Yeremin, D Y ^a   Sandy, M ^a   Goldburt, E T ^a  

^a Nanometrology LLC   (United States)

Author keywords

CD SEM metrology; Measurement precision; Pixel value; Scan non linearity; Signal to noise ratio; Stability

Indexed keywords

CALIBRATION; MEASUREMENT THEORY; SCANNING ELECTRON MICROSCOPY; SIGNAL TO NOISE RATIO;

NANOMETROLOGY;

NANOTECHNOLOGY;

EID: 0036028778     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.473446     Document Type: Article

References (8)

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3. A. Engelen, I. Minnaert-Janssen, Multiple CD-SEM Matching for 0.18μm Lines/Spaces at Different Exposure Conditions, SPIE Microlithography Conference, March 1999, Santa Clara, CA.
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7. A. Nikitin, A. Sicignano, D. Yeremin, M. Sandy and T. Goldburt, Scan Linearity: A Hidden Factor in SEM Magnification Calibration, NanoScience NIST Workshop, September 5-7, 2001, Gaithersburg, MD.
8. A. Sicignano, A.V. Nikitin, D.Y. Yeremin, M. Sandy and E.T. Goldburt, Factors Influencing CD-SEM Metrology, SPIE Microlithography, March 3-8, 2002.