Correlation between the microstructures and the cycling performance of RuO2 electrodes for thin-film microsupercapacitors

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 5, 2002, Pages 1827-1832

  Kim, Han Ki ^a,b   Seong, Tae Yeon ^b   Lim, Jae Hong ^a   Ok, Young Woo ^b   Cho, Won Il ^a   Shin, Young Hwa ^c   Yoon, Young Soo ^a  

^a Korea Institute of Science and Technology   (South Korea)

^b Gwangju Institute of Science and Technology (GIST)   (South Korea)

^c Gachon University College of Medicine   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CAPACITORS; CORRELATION THEORY; ELECTRODES; MICROSTRUCTURE; RUTHENIUM COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR GROWTH; SOLID STATE DEVICES; THIN FILM DEVICES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

GLANCING ANGLE X RAY DIFFRACTION; OXYGEN GAS FLOW RATIOS; RUTHENIUM DIOXIDE ELECTRODES; SOLID STATE MICROSUPERCAPACITORS; THIN FILM MICROSUPERCAPACITORS;

MICROELECTRONICS;

EID: 0036026347     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1500752     Document Type: Article

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