Selective wet etching of AlGaAs in HF/CrO3 solutions: Application to vertical taper structures in integrated optoelectronic devices

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 3, 2002, Pages 1107-1110

  Huang, Hui ^a   Huang, Yongqing ^a   Ren, Xiaomin ^a  

^a BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; ETCHING; INTEGRATED OPTOELECTRONICS; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SOLUTIONS;

SELECTIVE WET ETCHING;

SEMICONDUCTING ALUMINUM COMPOUNDS;

EID: 0035998544     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1481861     Document Type: Conference Paper

References (13)